The Sigma 360VP field emitter device with GEMINI® electron optics enables high-resolution imaging of the surfaces of solids with exceptional depth of field. The innovative technology uses field emission to generate an electron beam that precisely scans the sample in a high vacuum. Compared to conventional scanning electron microscopes with a tungsten cathode, this enables a higher electron density and more precise focusing of the beam. This technology enables resolutions in the single-digit nm range.
The interaction products that arise when the electron beam hits the sample surface are recorded and provide valuable image information about the surface properties. With secondary and backscattered electron contrast, different forms of representation can be selected, which enables detailed evaluations of fracture surfaces and topographies.
In order to produce high-quality images in the Sigma 360VP, the sample does not necessarily have to be conductive. This is supported by the possibility of handling in the variable pressure range, which eliminates the need for vapor deposition with gold or graphite layers.
Possible applications of the Sigma 360VP:
- Damage analyses of materials and manufactured components
- testing of medical devices
- Characterization of electronic and semiconductor devices in process control and diagnostics
- High-resolution imaging and analysis of new nanomaterials
- analyses of coatings and thin films
- Imaging, Analysis and Differentiation of Polymer Materials
- Conducting battery research to understand aging effects and quality improvements
- SmartPI fully automatic particle analysis according to ISO 16232 and VDA 19 Part 1 and 2 for technical cleanliness
Detectors of the Sigma 360VP:
- In-lens SE detector: The interaction of the electron beam with the sample releases secondary electrons that create a topographic contrast. This image representation is ideal for documenting and evaluating surface structures such as fracture surfaces and corrosion attacks.
Compared to conventional scanning electron microscopes, the chamber detector for secondary electrons is installed in the beam path. Consequently, a better signal yield leads to higher-resolution images.
- VPSE detector: The variable pressure SE detector delivers high-resolution images even in the low vacuum range when examining non-conductive samples.
- AsB detector: Here the imaging signal is generated by slowed and deflected primary electrons. The energy of the backscattered electrons depends on the density of the sample material, which enables the visualization of impurities, layer systems or inclusions.
- EDX detector: When the electron beam interacts with the sample material, characteristic X-rays are generated, which allows a qualitative and semi-quantitative determination of the chemical composition. In addition to point and integral analyses, line scans and mappings in false color representation can also be carried out in order to clearly show differences in the composition.
